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Improved Resolution of Thick Film Resist(Effect of Pre-Bake Condition)
[SPIE] |
Improved Resolution of Thick Film Resist(Effect of Development Technique)
[SPIE] |
Study on Improved Resolution of Thick Film Resist(Verification by Simulation)
[SPIE] |
厚膜レジストにおけるプリベーク条件が解像性に与える影響
[電子情報通信学会] |
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厚膜レジストにおける現像方法の違いによる解像性の検討
[電子情報通信学会] |
厚膜レジストの高解像化に関する検討
[電子情報通信学会] |
In-situ Measurement of Outgassing from Chemically Amplified Resist during Exposure to 248nm Light [Journal of Photopolymer Science and Technology] |
Study of De-protection Reactions for Chemically Amplified Resist
[Journal of Photopolymer Science and Technology] |
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Study of Deprotection Reaction during Exposure in Chemically Amplified Resist for Lithography Simulation [Journal of Photopolymer Science and Technology] |
Analysis of Deprotection Reaction for Chemically Amplified Resists by Using FT-IR Spectrometer with Exposure Tool
[SPIE] |
Measurements of Parameters for Simulation of Deep UV Lithography Using a FT-IR Baking System [SPIE] |
Analysis of Deprotection Reaction in Chemically Amplified Resists Using an Fourier Transform Infrared Spectrometer with an Exposure Tool [Japanese Journal of Applied Physics] |
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Measurement of Parameters for Simulation of 193nm Lithography Using Fourier Transform Infrared Baking System
[Japanese Journal of Applied Physics] |
Study of Proximity Lithography Simulations Using Measurements of Dissolution Rate and Calculation of the Light Intensity Distributions in the Photoresist
[SPIE] |
Development of Analysis System for F2-Excimer Laser Photochemical Processes
[SPIE] |
Resist Metrology for Lithography Simulation, Part 2: Development Parameter Measurements
[SPIE] |
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Approach for High-resolution of Chemically Amplified Resists Using Rate Editor Software
[The Japan Society of Applied Physics] |
Development of Photochemical Analysis System for F2-Excimer Laser Lithography Processes
[The Japan Society of Applied Physics] |
厚膜レジストにおける実測溶解速度を用いたプロキシミティ・リソグラフィ・シミュレーションの検討
[電気学会論文誌] |
ホトリソグラフィ用化学増幅レジストのシミュレーションパラメータの推算
[電子情報通信学会] |
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P.E.B.プロセスにおけるホトレジストの感光剤の拡散長の推算
[電子情報通信学会] |
ホトレジスト現象パラメータ測定システムの開発
[電子情報通信学会] |
ホトレジストの感光パラメータ（A,B,C）測定装置の開発
[電子情報通信学会] |
ホトリソグラフィにおける実測溶解速度を用いたデフォーカスシミュレーションの検討
[電子情報通信学会] |
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