We offer a variety of equipment for advanced evaluation of photoresists. We will continue to provide new evaluation equipment, such as equipment to analyze the deprotection reaction of resists, patterning systems for nanoimprints and environment test systems, to meet specific customer needs.
Lineup
●PAGA-100
(Photo-acid Generator Analyzer)
This equipment is the photo-acid generator analyzer for chemically amplified resists based on the FT-IR spectrometer with the bake monitoring function after in-situ exposure. The bake unit with a 10 mm in diameter hole is allocated in the FT-IR measurement chamber. The system is also equipped with an ultraviolet (248 nm) irradiation device and can also be used for analysis of a mechanism generating acid during exposure.
FT-IR System: FTS-3000, Detector, MCT-supported (Made by Varian Technologies) Bake Unit: 4- to 8-inches-compatible Bake Unit (Max. 150°C)
●LTNIP-5000 (UV and Thermal Imprint Evaluation System)
This system is best suited for development and evaluation of resist materials for imprints.
Light source: Extra high pressure mercury lamp. 248 nm to 436 nm through the filter and broad band exposure.
Press: Max. press pressure 20 MPa, vacuum chamber supported, equipped with a simplified alignment mechanism.
