The Litho Spin Cup series products are manually operated equipment that demonstrate high performance comparable to automatic coaters and resist developers.
The line of products features as standard equipment automatic dispensers, various rinsing functions, including back side rinse, and automatic centering mechanisms. Unique specifications are also supported to suit your request by adding necessary functions and removing unnecessary functions. The product line include models that can handle multiple substrates of various sizes ranging from small irregularly shaped substrates up to φ450-mm wafers.
Just as with an automatic equipment, the number of discharge lines can be specified. The system comes with an edge bead remover (EBR), back side rinse (BSR), and automatic exhaust damper. Various other options are also available depending on the application, including resist temperature control, fan filter unit, chemical filter, and temperature and humidity control of the atmosphere inside the coating chamber. The system can handle various substrate sizes from small irregularly shaped substrates up to φ450-mm wafers.
The programmable swing arm and various nozzle types, including a stream nozzle, slit nozzle, and spray nozzle, enable development and rinsing for specific applications.
It makes it easier to set conditions that control the line width of resist patterns and improve in-plane line width uniformity on 300-mm wafers. It’s used for research and development and to produce a range of devices in small quantities.