[Products] | LTNIP-500 | LTNIP-5000 | LTNIP-7000 | WEX-200 | WMA-600
Simple UV nanoimprinting equipment for experiment
Mold size: 25mm to 40mm
Wafer size: 4inch to 6inch (Si)
Illuminance of UV: 0.5 mW/cm²
Available to add the function of hot plate and exhaust unit (option)
Thermal/vacuum UV nanoimprinting equipment for experiment
Mold size: 25mm to 40mm
Wafer size: 4inch to 6inch (Si)
Bake temp.: RT to 200℃
Stamping pressure: 100 to 9,999N
(Adjustable by 0.1N step)
Illuminance of UV: 5 mW/cm²
Available to add cooling function for hot plate, and exhaust unit (option)
Flat plate roll-type thermal / UV nanoimprint equipment for experiment
Mold size: max 50mmφ (flat plate)
Roll size: 100mm (width)
Bake temp.: RT to 150℃
Stamping pressure: 100 to 9,999N
(Adjustable by 0.1N step)
Illuminance of UV: 5 mW/cm²
Available to add the defect rate measurement unit by reflectance measuring for moth-eye printing (option)
One-shot exposure equipment for nanoimprint
Exposure wavelength: 246nm, 365nm, 405nm, 436nm and broadband
Illuminance: 50mW/cm²
Exposure area: 125mmφ
Aligner for nanoimprint mold
Micro scope: twin scopes equipped
Magnification: max 20 times
Alignment accuracy: less than 15 μm
Wafer size: 4, 5, 6 inchφ