The LTNIP-500 is a simple UV nanoimprinting equipment designed for experimental applications.
This model uses UV light for resin curing while pressing samples.

Mold size:                 25mm to 40mm
Wafer size:                4inch to 6inch (Si)
Illuminance of UV:      0.5 mW/cm²

 

Available to add the function of hot plate and exhaust unit (option)

The LTNIP-5000 is a thermal/vacuum UV nanoimprinting equipment designed for experimental applications.
It supports up to 9,999 N and irradiates UV light (vacuum compatible) and heats while pressing samples.

Mold size:                25mm to 40mm
Wafer size:               4inch to 6inch (Si)
Bake temp.:              RT to 200℃
Stamping pressure:    100 to 9,999N
                              (Adjustable by 0.1N step)
Illuminance of UV:      5 mW/cm²

 

Available to add cooling function for hot plate, and exhaust unit (option)

The LTNIP-7000 is a flat plate roll-type thermal UV nanoimprinting equipment designed for experimental applications.
It supports up to 9,999 N and irradiates UV light and heats while pressing samples.

Mold size:                max 50mmφ (flat plate)
Roll size:　                 100mm (width)
Bake temp.:               RT to 150℃
Stamping pressure:     100 to 9,999N
                               (Adjustable by 0.1N step)
Illuminance of UV:       5 mW/cm²

 

Available to add the defect rate measurement unit by reflectance measuring for moth-eye printing (option)

The WEX-200 is a one-shot exposure equipment designed for use after nanoimprinting.
Equipped with an Hg lamp, it supports exposure by emissions filtered at 246 nm, 365 nm, 405 nm, and 436 nm, as well as broadband exposures.

Exposure wavelength:    246nm, 365nm, 405nm, 436nm and broadband
Illuminance:                  50mW/cm²
Exposure area:             125mmφ

The WMA-600 is equipment which align mold to substrate for nanoimprinting.
It features two microscopes; the operator aligns the left and right alignment marks with a joystick, locking the positions of the mold and substrate. Imprinting is performed with nanoimprinting equipment.

Micro scope:               twin scopes equipped
Magnification:              max 20 times
Alignment accuracy:     less than 15 μm
Wafer size:                  4, 5, 6 inchφ